What is NILAB?
NanoImprint LABoratory-NILAB® is an open innovation platform founded by SILSEF in 2010. It is dedicated to the development of nanoimprint lithography and its application to a wide range of domains. NILAB® brings together leading laboratories, research centers and industrial partners. The objectives are to foster collaboration and joint development and to facilitate access to a large range of state of the art equipment, knowhow and patents. SILSEF and its partners collaborate in the context of private customer projects, as well as publicly funded programs such as ANR, French DoD, European projects. Activities include:
• Process development (patterns, stamps, press, etching and control)
• Applications for microelectronics, optics, tribology and more.
H. Kadiri, S. Kostcheev, D. Turover, R. Salas-Montiel, K. Nomenyo, A. Gokama, G. Lerondel, “Topology assisted self-organization of colloïdal nanoparticles : application to 2D large-scale nanomastering”, Beilstein journal of nanotechnology
H. Kadiri, A. Gokarna, A. Gwiazda, A. Rumyantseva; K. Nomenyo, R. Aad, G. Lerondel, “Towards multifunctional heterostructured materials : ZnO nanowires growth on mesoscale periodically patterned Si”, Physica Status Solidi (c)
H. Teyssedre, P. Gilormini, “Extension of the natural element method to surface tension and wettability for the simulation of polymer flows at the micro and nano scales”, Journal of Non-Newtonian Fluid Mechanics
S. Zanettini, V. Gâté, E. Usureau, J. Ruscica, F. Hamouda, K. Nomenyo, L. Le Cunff, H. Kadiri, G. Lerondel, Matteo Salomini, Rosalinde Plots, E. Auffray, P. Lecoq, J. Alamo, J. Prior, A. Iltis, D. Turover, “Improved Light Extraction Efficiency on 2 inches LYSO with Nanopatterned TiO2 Photonic Crystals”
R. Pots, M. Salomoni, S. Gundacker, S. Zanettini, V. Gate, E. Usureau, D. Turover, P. Lecoq, E. Auffray. Improving light output and coincidence time resolution of scintillating crystals using nanoimprinted photonic crystal slabs, Nuclear Inst. and Methods in Physics Research, A (2019)